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科学网视频号 北京时间2025年4月11日晚八点，iCANX Talks 第222期约请到了湖南年夜学传授段辉高作为主讲佳宾，南边科技年夜学传授郭传飞、北京年夜学助理传授郑雨晴，浙江年夜学研究员彭博宇担当钻研佳宾，北京年夜学传授张海霞担当主持人。 这将是一场会聚顶尖学者的嘉会，配合切磋前沿科技与学术挑战！更多出色，敬请期待！ 【佳宾先容】 
段辉高 湖南年夜学 Wafer-level Perfect Conformal Contact Photolithography towards the Diffraction Limit 【Abstract】 Lithography is a key enabling technique in modern micro/nanoscale technology. Achieving the optimal trade-off between resolution, throughput, and cost remains a central focus in the ongoing development. However, current lithographic techniques such as dirbevictor伟德官网ect-writing, projection, and extreme ultraviolet lithography achieve higher resolution at the expense of increased complexity in optical systems, thus significantly raising the overall cost of production. Here, we present a cost-effective and efficient soft-contact photolithography method, utilizing a transferable resist to achieve wafer-level perfect conformal contact lithography at the diffraction limit. By leveraging a transferable resist, the technique ensures optimal contact between the mask and resist, facilitating the precise transfer of patterns at the diffraction limit while maintaining high fidelity and uniformity across large wafers. The proposed technique significantly expands the potential of contact photolithography for novel device architectures and manufacturing processes. 光刻是现代微/纳米技能中的要害使能技能。于分辩率、吞吐量及成本之间实现最好衡量是光刻技能研发的重点。当前工业界经常使用的光刻技能，如直写光刻与投影光刻，可实现极高的分辩率，但往往以光学体系繁杂性增长为价钱，从而显著提高了总体出产成本。接触式光刻，于理论上也拥有光学衍射极限的分辩率且拥有极低成本上风，于试验室研发中被广泛利用，但因共形接触、对于缺陷极端敏感和硬接触带来的掩模版毁伤等难题，没法用在范围化出产。本陈诉中，咱们将分享一种使用可转移的光刻胶实现完善共形接触式光刻的技能，该技能拥有近衍射极限分辩率、年夜面积匀称性、近零掩模版毁伤等上风，使患上接触式光刻于工业界运用成了可能。 【BIOGRAPHY】 Huigao Duan is a professor of Mechanical Engineering at Hunan University and a recipient of the National Outstanding Young Scientist Fund. He received his BS and PhD in Physics from Lanzhou University in 2004 and 2010, respectively. From 2006 to 2008, he was working as a Researcher in Institute of Electrical Engineering, Chinese Academy of Sciences. From 2008 to 2012, he was a visiting student at Massachusetts Institute of Technology and then a Research Scientist in Institute of Materials Research and Engineering, A*STAR (Singapore). He was also a visiting scientist at the University of Stuttgart in 2012, hosted by Prof. Harald Giessen. He joint Hunan University as a full professor in 2012 and then setup a micro/nanofabrication laboratory there. He has co-authored more than 290 peer-reviewed journal papers with an H-index of 74. His current research interest is ultraprecision micro/nanomanufacturing and its optical applications. He has served as Editor or Associate Editor for several renowned journals such as International Journal of Extreme Manufacturing and Deputy Editor for Research (a Science Partner Journal). 段辉高，2004年和2010年获兰州年夜学物理学学士及博士学位，曾经前后于中科院电工所、美国麻省理工学院、新加坡科技研究局质料工程研究院、德国斯图加特年夜学和马普固体所、英国南安普顿年夜学等机构从事科研事情，2012年插手湖南年夜学。曾经获天下百优、国度优青、国度杰青等人材项目撑持，于Nature Nanotechnology、Nature Energy、Light: Science Applications等海内外期刊上发表论文290余篇，H因子为74，现担当《极度制造（英文）》，Research、《光学 周详工程》等5本期刊编委或者副主编。段辉高于电子束光刻极限分辩率机理、离子束增减材协同制造工艺、年夜幅面高分辩完善接触式光刻技能等方面做出了系列原创性事情，为微纳光学和平面光学等器件研发提供了超周详微纳制造解决方案。 尤其声明：本文转载仅仅是出在流传信息的需要，其实不象征着代表本网站不雅点或者证明其内容的真实性；如其他媒体、网站或者小我私家从本网站转载利用，须保留本网站注明的 来历 ，并自大版权等法令责任；作者假如不但愿被转载或者者接洽转载稿费等事宜，请与咱们联系。-韦德体育
